Telemark Ion Beam Sources
SKU:
$0.00
per item
Telemark ST and XIAD ion sources have been designed to provide superior Gridless End-Hall ion source performance across large and small substrates. Telemark ion source technology offers low pressure operation (10^-5 mbar) for longer mean free path and higher ion energies than traditional End Hall sources.
The source design is extremely low maintenance with no replaceable internal components. The Telemark ion source line is capable of either mixed gas or pure oxygen operation, allowing for deposition of metal oxide films of the highest index and lowest stress. Patented Pulsed Mode for ion assisted fluorides provides fully compacted, damage free results not achievable with any other ion source.
The Telemark sources achieve stable films with no substrate pre-heating, and are an excellent choice for depositing durable films on low temperature substrates.
The source design is extremely low maintenance with no replaceable internal components. The Telemark ion source line is capable of either mixed gas or pure oxygen operation, allowing for deposition of metal oxide films of the highest index and lowest stress. Patented Pulsed Mode for ion assisted fluorides provides fully compacted, damage free results not achievable with any other ion source.
The Telemark sources achieve stable films with no substrate pre-heating, and are an excellent choice for depositing durable films on low temperature substrates.
Telemark ST and XIAD ion sources have been designed to provide superior Gridless End-Hall ion source performance across large and small substrates. Telemark ion source technology offers low pressure operation (10^-5 mbar) for longer mean free path and higher ion energies than traditional End Hall sources.
The source design is extremely low maintenance with no replaceable internal components. The Telemark ion source line is capable of either mixed gas or pure oxygen operation, allowing for deposition of metal oxide films of the highest index and lowest stress. Patented Pulsed Mode for ion assisted fluorides provides fully compacted, damage free results not achievable with any other ion source.
The Telemark sources achieve stable films with no substrate pre-heating, and are an excellent choice for depositing durable films on low temperature substrates.
The source design is extremely low maintenance with no replaceable internal components. The Telemark ion source line is capable of either mixed gas or pure oxygen operation, allowing for deposition of metal oxide films of the highest index and lowest stress. Patented Pulsed Mode for ion assisted fluorides provides fully compacted, damage free results not achievable with any other ion source.
The Telemark sources achieve stable films with no substrate pre-heating, and are an excellent choice for depositing durable films on low temperature substrates.